FLIT is an optics simulation software that specializes in (F)PhotoLITography applications.
The mask in this simulation is described using a vector file, which is rasterized with the required resolution. At present, FLIT is only supported in a Linux environment. The application lacks an installer and may contain bugs, but it still works quite well. Furthermore, it can accurately compute a diffraction pattern of light in photolithography devices, projecting the image of the mask pattern into a destination using short length light waves. All the simulation's major parameters can be altered as required.
However, even though the software currently runs only on Linux, the porting process to other operating systems is a straightforward process. The C section should be able to compile on MinGW or Cygwin environments with some minor changes, or even without them. If you have an intention of employing it on Windows, please send me a mail regarding it.
Version 0.2.4: N/A